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Defects in paramagnetic Co-doped ZnO films studied by Transmission electron microscopy

机译:透射电子显微镜研究顺磁性共掺杂ZnO薄膜的缺陷

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摘要

We study planar defects in epitaxial Co:ZnO dilute magnetic semiconductor thin films deposited on c-plane sapphire (Al2O3), as well as the Co:ZnO/Al2O3 interface, using aberration-corrected transmission electron microscopy and electron energy-loss spectroscopy. Co:ZnO samples that were deposited using pulsed laser deposition and reactive magnetron sputtering are both found to contain extrinsic stacking faults, incoherent interface structures, and compositional variations within the first 3–4 Co:ZnO layers next to the Al2O3 substrate. The stacking fault density is in the range of 1017 cm−3. We also measure the local lattice distortions around the stacking faults. It is shown that despite the relatively high density of planar defects, lattice distortions, and small compositional variation, the Co:ZnO films retain paramagnetic properties.
机译:我们使用像差校正透射电子显微镜和电子能量损失谱研究了在c面蓝宝石(Al2O3)上沉积的外延Co:ZnO稀磁半导体薄膜以及Co:ZnO / Al2O3界面中的平面缺陷。发现使用脉冲激光沉积和反应磁控溅射沉积的Co:ZnO样品均在与Al2O3相邻的前3–4个Co:ZnO层中包含外在堆垛层错,不连贯的界面结构和成分变化。堆垛层错密度在1017 cm-3的范围内。我们还测量了堆垛层错周围的局部晶格畸变。结果表明,尽管相对较高的平面缺陷密度,晶格畸变和小的成分变化,Co:ZnO薄膜仍保持顺磁性。

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